基于几何相位分析的Nb/Si{111}界面应变研究
李 旭,任玲玲,高思田,周丽旗,陶兴付*
(中国计量科学研究院 纳米新材料计量研究所,北京100029)
摘 要 本文使用高分辨透射电镜(HRTEM)成像和几何相位分析,研究不同溅射气压制备的铌薄膜/硅基体的界面微观结构和应变状态。研究结果表明:铌薄膜表面由花瓣状层片组织构成,层片组织随机分布,没有明显的特征取向;随着溅射气压的增大,层片尺寸随之增大,致密度减小,出现了大量孔隙,铌薄膜和硅基体之间产生铌、硅元素的混合层;随着溅射气压的增大,硅基体中应变的大小和方向均不相同,溅射气压对硅基体的应变状态具有很大影响;硅基体的应变主要来自于界面混合层和铌薄膜的作用,混合层中铌原子和硅原子相互混杂,存在大量结构缺陷,产生本征应力,从而导致硅基体中产生应变。
关键词 高分辨成像;几何相位分析;铌薄膜;硅基体;混合层;应变
中图分类号:TB383;TG146.4+16;TG 115.21+5.3 文献标识码:A doi:10.3969/j.issn.1000-6281.2016.06.001
Strain study of Nb/Si{111} interface based on geometric phase analysis
LI Xu,REN Ling-ling,GAO Si-tian,ZHOU Li-qi,TAO Xing-fu*
(1. Division of Nano Metrology and Materials Measurement, National Institute of Metrology, Beijing 100029,China)
Abstract In this paper, high resolution electron microscopy imaging and geometric phase analysis were employed to study the microstructure and strain states of Nb/Si interface prepared at different sputtering pressures. The results show that the surface of Nb thin film consists of petals-shapelamellas with random morphological distribution and no obvious characteristic orientation. The size of lamella increases and the density of lamella decreases with the increase of deposition pressure, meanwhile, a large number of pores appear on the surface of Nb film and a mixed layer of Nb and Si is generated between the Nb film and Si substrate. The magnitude and direction of strain in the Si substrate are changed with the increase of disposition pressure. The strain states of Si substrate are tremendously influenced by the disposition pressure. The strain states of Si substrate are mainly produced by the effect of the interfacial mixed layer and the Nb thin film.A large number of structure defects are generated in the mixed layer of Nb and Si, which produces intrinsic stress in the mixed layer, and further results in the formation of strain in the Si substrate.
Keywords high-resolution imaging;geometric phase analysis;Nb thin film;Si;mixed layer;strain
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[1] ROKHINSON L P, LIU X, FURDYNA J K. The fractional a.c. Josephson effect in a semiconductor-superconductor nanowire as a signature of Majorana particles[J]. Nature Physics, 2012, 8(11): 795–799.
[2] VÄYRYNEN J I, RASTELLI G, BELZIG W, et al. Microwave signatures of Majorana states in a topological Josephson junction[J].Physical Review B, 2015, 92(13): 2466–2472.
[3] ANNUNZIATA A J, SANTAVICCA D F, CHUDOW J D, et al. Niobium superconducting nanowire single-photon detectors[J]. IEEE Transactions on Applied Superconductivity, 2009, 19(3):327–331.
[4] LU H Z,SHEN S Q.Extrinsic anomalous Hall conductivity of a topologically nontrivial conduction band[J]. Physical Review B Condensed Matter, 2013, 88(8): 1336–1340.
[5] ARSLAN E. Structural, mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering[J]. Surface Engineering, 2010, 26(8):615–619.
[6] KALISZ M, GROBELNY M. Determination of Structural, Mechanical and Corrosion Properties of Titanium Alloy Covered by Thin Films Based on Graphene and Silicon Nitride[J]. E-Journal of Surface Science and Nanotechnology, 2015, 13(0): 289–294.
[7] CASABURI A, ZEN N, SUZUKI K, et al. Subnanosecond time response of large-area superconducting stripline detectors for keV molecular ions[J]. Applied Physics Letters, 2009, 94(21): 212502-1–212502-3.
[8] KRISHNAN R, DAVID C, AJIKUMAR P K, et al. Reactive pulsed laser deposition and characterization of niobium nitride thin films[J]. Surface Coatings and Technology, 2011, 206(6):1196–1202.
[9] UFUKTEPE Y, FARHA A H, KIMURA S I, et al. Superconducting niobium nitride thin films by reactive pulsed laser deposition[J]. Thin Solid Films, 2013, 545(31): 601–607.
[10] VASU K, KRISHNA M G, PADMANABHAN K A. Effect of Nb concentration on the structure, mechanical, optical, and electrical properties of nano-crystalline Ti1-xNbxN thin films[J]. Journal of Materials Science, 2012, 47(8):3522–3528.
[11] MAMUN M A A, FARHA A H, UFUKTEPE Y, et al. Investigation of the crystal structure on the nanomechanical properties of pulsed laser deposited NbN thin films[J]. Tms Meeting & Exhibition, 2012, 4(24): 715–722.
[12] MAMUN M A A, FARHA A H, UFUKTEPE Y, et al. Nanoindentation study of niobium nitride thin films on niobium fabricated by reactive pulsed laser deposition[J]. Applied Surface Science, 2015, 330(1):48–55.
[13] FALUB C V, THORWARTH G, AFFOLTER C, et al. A quantitative in vitro method to predict the adhesion lifetime of diamond-like carbon thin films on biomedical implants[J]. Acta Biomaterialia, 2009, 5(8): 3086–3097.
[14] HAIDER J, RAHMAN M, CORCORAN B, et al. Simulation of thermal stress in magnetron sputtered thin coating by finite element analysis[J]. Journal of Materials Processing Technology, 2005, 168(1): 36–41.
[15] JEON S,LEE H,JO I, et al. Degradation of TiN Coatings on Inconel 617 and Silicon Wafer Substrates Under Pulsed Laser Ablation[J]. Journal of Materials Engineering & Performance, 2014, 23(5): 1651–1655.
[16] 程开甲, 程漱玉. 薄膜内应力的分析和计算[J]. 自然科学进展, 1998, 8(1): 20–29.
[17] 程开甲, 程漱玉. 电子边界是决定分子间作用特性的重要条件[J]. 科技导报, 1993, 12: 30–31.
[18] 程开甲, 程漱玉. TFD模型和余氏理论对材料设计的应用[J]. 自然科学进展, 1993, 3(5): 417–432.
[19] 路晓翠, 周炳卿, 张林睿, 等. 衬底和退火温度对多晶硅薄膜结构及光学性质影响[J]. 电子元件与材料, 2015, 34(11): 35–39.
[20] 蒲吉斌, 王立平, 薛群基. 多尺度强韧化碳基润滑薄膜的研究进展[J]. 中国表面工程,2014, 27(6): 4–27.
[21] WANG C,CAO Q P,WANG X D,et al. Stress-dependent shear transformation zone in Ni-Nb thin film metallic glass and its correlation with deformation mode transition[J]. Scripta Materialia, 2016, 122: 59–63.