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类四方BiFeO3薄膜中新型极化拓扑结构研究

陈双杰，唐云龙*, 朱银莲*, 马秀良
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2023年 第42卷 第4期:  1000-6281（2023）04-424-009     下载地址：

类四方BiFeO3薄膜中新型极化拓扑结构研究

陈双杰，唐云龙*, 朱银莲*, 马秀良

(1.中国科学院金属研究所沈阳材料科学国家研究中心，辽宁沈阳110016；2.中国科学技术大学材料科学与工程学院，辽宁沈阳110016;3. 松山湖材料实验室大湾区显微科学与技术研究中心，广东东莞523808; 4. 中国科学院物理研究所，北京100190)

摘  要  结合像差校正透射电子显微术和精密脉冲激光沉积技术，本文研究了生长在LaAlO3衬底上的单层铁电BiFeO3薄膜中应变调控和缺陷诱导的极化涡旋拓扑畴组态。HAADF-STEM成像揭示了薄膜中的层状BiO+ 面缺陷有助于稳定畴壁面为(100)型的类180度畴结构，并在这种新型的180度畴壁和LaAlO3界面相交区域诱导形成了半涡旋和极化涡旋拓扑结构。

关键词  半涡旋-涡旋；180 度畴壁；像差校正电子显微学；类四方BiFeO3薄膜

中图分类号：TB383；O77；TG115. 21+ 5. 3  文献标识码：A  doi:10.3969/j.issn.1000-6281.2023.04.004

 

Study on the novel polar topological structures of T-like BiFeO3 films

CHEN Shuang-jie1,2, TANG Yun-long1*, ZHU Yin-lian3*, MA Xiu-liang3,4

(1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang Liaoning 110016；2. School of Materials Science and Engineering, University of Science and Technology of China, Shenyang Liaoning 110016；3.Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan Guangdong 523808, China; 4. Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China)

Abstract    Combined with aberration-corrected scanning transmission electron microscopy and pulsed laser deposition, this work presents the strai-mediated and defects-induced topological vortex domain configurations in monolayer ferroelectric BiFeO3 films grown on LaAlO3 substrates. HAADF-STEM images indicate that the 180°-like domain structures with (100)-type domain walls can be stabilizedby layered BiO+ planar defects. Besides, the semi-vortex and polar vortex topologies are generated at the intersection regions of the novel 180°-like domain walls and LaAlO3 interface.

Keywords  semi-vortex and vortex polarization; 180°domain wall; aberration-corrected scanning transmission electron microscopy; T-like BiFeO3film

 

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