高温与电子束辐照共同作用下SiOx材料的结构演化研究

高温与电子束辐照共同作用下SiO_x材料的结构演化研究

梁  芮，陈国新，黄  钦^*，王  楠，唐发俊，张志佳，卢焕明，康建立

（1.天津工业大学材料科学与工程学院，天津 300387；2.中国科学院宁波材料技术与工程研究所，浙江 宁波 315201；3.广东省科学院半导体研究所，广东 广州 510650；4.中国电子科技集团公司第四十六研究所，天津 300220；5.天津大学材料科学与工程学院，天津300072)

摘  要 本文利用透射电子显微镜原位加热技术研究了高温下SiO_x材料的结构演化行为，并通过EELS谱分析了SiO_x材料结构的化学组成变化。研究结果表明：在高温作用下，电子束辐照对SiO_x材料的相分离过程起到了促进作用；高密度电子束辐照是SiO_x材料中产生孔状结构的主要原因；SiO_x材料在高温和电子束辐照作用下，会快速形成纳米硅镶嵌在多孔二氧化硅薄膜中的特殊结构。

关键词  SiO_x材料；电子束辐照；原位TEM加热

中图分类号：O484.5  文献标识码：A  doi:10.3969/j.issn.1000-6281.2021.04.002

The research on the structural evolution of SiO_x under the combined effect of high temperature and electron beam irradiation

LIANG Rui^1，2，5，CHEN Guo-xin²，HUANG Qin^1，3*，WANG nan⁴，TANG Fa-jun⁴，ZHANG Zhi-jia¹，LU Huan-ming²，KANG Jian-li⁵

(1. School of materials science and engineering, TianGong University, Tianjin 300387；2. Ningbo Institute of Material Technology and Engineering, Ningbo Zhejiang 315201；3. Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou Guangdong 510650；4. The 46th Research Institute of China Electronics Technology Group Corporation, Tianjin 300387；5. School of materials science and engineering, Tianjin University，Tianjin 300072，China)

Abstract   In this paper, the structural evolution of SiO_x at the high temperature was studied by in-situ heating with transmission electron microscopy (TEM), and the chemical composition of SiO_x was analyzed by electron energy loss spectrum (EELS). The results show that electron beam irradiation promotes the phase separation process of SiO_x andthe high density electron beam irradiation is the main reason for the formation of porous structure in SiO_x at high temperature. Under the combined effect of high temperature and electron beam irradiation, SiO_x rapidly form a special structure of nano-crystalline silicon embedded in porous silica.

Keywords   SiO_x；electron beam irradiation；in-situheating by TEM

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