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两种衬底上Cr2O3薄膜的制备与显微结构表征

李 想，姚婷婷，江亦潇，陈春林*，马秀良，叶恒强
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2022年 第41卷 第4期: 1000-6281（2022）04-393-06     下载地址：

两种衬底上Cr2O3薄膜的制备与显微结构表征

李  想，姚婷婷，江亦潇，陈春林*，马秀良，叶恒强

(1.中国科学院金属研究所 沈阳材料科学国家研究中心,辽宁 沈阳110016; 2.中国科学技术大学 材料科学与工程学院，辽宁 沈阳110016;3.季华实验室，广东 佛山528200)

摘  要 本文利用脉冲激光沉积（PLD）技术分别在MgO(100)和Al2O3(0001)两种衬底上制备了Cr2O3薄膜，并借助X射线衍射仪和透射电子显微镜对两种薄膜的显微结构进行了表征。研究结果表明：由于MgO与Cr2O3的晶体结构不同，界面存在较大的晶格失配，MgO(100)衬底上制备的薄膜为低质量的Cr2O3多晶薄膜。薄膜致密度低，孔隙多，晶粒排列呈现纵横交织（90°取向差）的特征。由于Al2O3与Cr2O3具有相同的晶体结构，界面失配小，Al2O3(0001)衬底上的薄膜为高质量的Cr2O3单晶外延薄膜。薄膜均匀致密，外延性好，界面平整明锐，薄膜中形成了大量的贯穿位错线。

关键词  Cr2O3；脉冲激光沉积；单晶薄膜；位错；显微结构

中图分类号：O484.1；O731；O77；O711   

文献标识码：A      doi:10.3969/j.issn.1000-6281.2022.04.005

 

Preparation and microstructure characterization of Cr2O3 thin films on two substrates

LI Xiang1，2, YAO Ting-ting1，3, JIANG Yi-xiao1，3, CHEN Chun-lin1，3*, MA Xiu-liang1, YE Heng-qiang3

(1. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang Liaoning 110016; 2. School of Material Science and Engineering, University of Science and Technology of China, Shenyang Liaoning 110016; 3. Ji Hua Laboratory, Foshan Guangdong 528200, China)

Abstract  In this paper, Cr2O3 thin films have been prepared on MgO (100) and Al2O3 (0001) substrates by pulsed laser deposition (PLD), respectively. The microstructures of the two thin films have been investigated by X-ray diffractometer and transmission electron microscope. The results are as follows: Due to the different crystal structures of MgO and Cr2O3, there is a large lattice mismatch at the interface, the Cr2O3 films on the MgO (100) substrate are low-quality and polycrystalline. The films have low density and many pores. The grain arrangement in the films is characterized by vertical and horizontal interweaving (90° misorientation). Since Al2O3 and Cr2O3 have the same crystal structure and a small interface mismatch, the Cr2O3 films on the Al2O3 (0001) substrate are high-quality single-crystal epitaxial films. The films are uniform and dense, and have a good epitaxy with the substrate. The interface between film and substrate is flat and sharp. A large number of threading dislocations are formed in the films.

Keywords  Cr2O3; pulsed laser deposition; single-crystal thin film; dislocation; microstructure

 

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